| Model No. | Inner dimensions: WxDxH cm | Outer dimensions: WxDxH cm | Power | Temperature range | Temperature evenness |
| QHWO-2 | 61 x 61 x 61 | 145 x 113 x 122 | 220V 3φ 60Hz 9KVA / 15KV |
+60 ~ 300°C Max. +60 ~ 500°C Max. |
300°C ± 1.5% 500°C ± 2% |
| QWO-2DS (Two-chamber) | 71 x 61 x 56 | 146 x 96 x 180 | 220V 3φ 60Hz 12KVA |
+60 ~ 250°C Max. | at 200°C ± 1.5% (No-Load) |
| QWO-4D (Cart-type) | 71 x 61 x 91 | 138 x 90 x 140 |
QWO oxidation-free oven
Features
- An oxidation-free oven differs from a clean oven in that the chamber is inflated with inertial gas during drying, which avoids product oxidation, and the optimal airtightness brings down the oxygen level to 10 ppm. An optimal oxygen-free drying environment is fulfilled.
Application
- For use in respective industries such as IC encapsulation, wafer drying, and coating.
10 ppm oxidation-free key technology
- Special decompression design: Valves with the ventilating volume that may be adjusted along with the amount of air let in keep the pressure inside the chamber positive and maintain a low oxygen-content environment.
- The air-tight tubular heating outlet comes with the inner and outer insulation design for reinforced airtightness.
- N2 flow-regulating design – The nitrogen loop design is divided into two parts (main/auxiliary) and allows automatic control of the flows.
- Cooling inter1ayer design – The special indirect cooling approach enables retention of an oxidation-free environment when the temperature drops.
- Inner door design – It forms a shapeless nitrogen wall to keep off external gases while at the same time preventing heat loss.
- N2 is instilled into the outbound pipeline and door frame and the waste heat from heat transfer is recycled to reduce energy waste.
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